Mixture for silicon coating of glass
专利摘要:
Glass is coated with an alkali-resistant silicon coating by moving the glass past a coating station while the glass is at least at 400 DEG C. Silane-containing gas is released close to the glass surface, which gas includes a proportion of a gaseous electron-donating compound which imparts a predetermined alkali-resistance to the coating produced when silane in the gas pyrolyzes at the glass surface. 公开号:SU878191A3 申请号:SU782586050 申请日:1978-03-01 公开日:1981-10-30 发明作者:Ландо Манфред 申请人:Пилкингтон Бразерз Лимитед (Фирма); IPC主号:
专利说明:
154) MIXTURE FOR APPLYING SILICON COATING ON GLASS The invention relates to the preparation of transparent protective coatings for glass. The known mixture for applying a silicon coating on glass, including polyethylene and silane. Closest to the proposed technical essence and the achieved result is a mixture for carrying silicon coating on glass, including monosilane, inert gas and hydrogen at a ratio of inert gas to hydrogen 0: 1 {.2 However, these mixtures do not provide high chemical resistance of glass coated to alkalis. The purpose of the invention is to increase the chemical resistance to alkalis. This goal is achieved by the fact that the known mixture for applying a silicon coating on glass, including monosilane and nitrogen, additionally contains an electron-donating compound in the following ratio of ingredients, vol. %: Monosnlan 0) 3-7 Lzot89-95 Electron-donating compound 0.2-6 with a ratio of electron donor to monosilane from 0.1; 1 to 2: 1, moreover, it contains ethylene, acetylene, butadiene, ammonia as an electron donor , difluoroethylene or benzene. The alkali resistance of the silicon coating is determined by determining the time during which the silicon coating resists a strong alkaline solution without visible damage. In some cases, depending on the alkali resistance of the glass and the amount of the used electron-donor composition, the alkali resistance of the coating obtained from the proposed mixture is higher than the alkali resistance of the glass itself. Electron-donating compounds used to impart alkali resistance to the silicon coating contain electrons in their electronic structure as a bond or as a single pair, which can be transferred to the electronic structure of suitable acceptor molecules or atoms. As a glass for which the coating is used, conventional commercial colorized sodium-regulating soda-lime silicate glass is used, containing small amounts of selenium and cobalt oxides as components, which are made in the form of a strip on the surface of the molten metal bath. While the glass being coated is at least at the temperature, it is stirred through the coating position. When the glass on which the coating is applied is manufactured on a molten metal bath, the coating is applied inside the vessel in which the molten metal bath is located near its outlet end, with the glass moving along this center as a strip. The glass temperature near the exit end of the bath is 600-650 0. On the other hand, the coating can be applied to the glass strip when it moves through the glass annealing furnace, where the glass has a temperature of 400-750 ° C. Glass is coated with the coating made by rolling or using vertical yarn. We offer the mixture to be applied when coating flat glass, including reinforced glass, in the form of a tape or strip, on molded glass products and on glass fiber. In order to ensure the desired rate of decomposition of silanes, the glass must have a temperature not lower (in the range of 400-850 ° C; preferably in the range of 500850 ° C. In tab. 1 shows specific examples of the proposed mixture. Ethylene was used as the electron donor compound. All the optical changes in question are made by known methods using the source C according to the classification of the International Commission on Illumination as a light source. Tab. 1 shows that the silicon coating obtained on image 2-12 using ethylene in gas, has an increased alkaline CKOfb compared to the coating of sample 1, i.e. a control sample, the coating on which was applied without the addition of ethylene to the silane-containing gas. Small changes in the percentage of ethylene have only a weak effect on the optical characteristics imparted to the glass by the silicon-containing coating. Experimental results show that with a small ratio of ethylene and monosilane content, which takes place in samples 2,3 and 4, the optical characteristics are practically no. However, there is a significant increase in the alkali resistance of the silicon-containing coating, expressed in the fact that visible traces of damage with the naked eye were not detected until the contact time for the glass with sodium hydroxide solution of the 1st normal concentration was at least ,1 hour. Optical measurements of the silicon-containing sample coating were measured. 5 1,2,4,5,10 and 12. When performing measurements, rhenium was used to compensate for the glass colouration by comparing the colorized glass samples that were coated and did not have it. The colored glass was replaced with 6 mm clear flat glass. In tab. 2 shows the optical properties of the transparent Ie5 sodium-sodium silicate 6 mm thick glass made on a molten metal bath and having a coating equivalent to that obtained on a colored glass. Q As long as the ratio of ethylene to silane in the gas does not exceed 0.1, the properties of the coated glass do not change significantly compared with the properties of sample 1, the coating on some were applied without being present ethylene in silane-containing gas. When the ethylene content increases, there is a uniform increase in alkali resistance, measured as a period of time during which The effect of alkali on glass becomes noticeable to the naked eye, and this period is not less than 5 hours and 50 minutes with a ratio of ethylene to silane equal to 1.2: 1. When conducting weather tests when the coated glass is exposed to a humid atmosphere, a silicon-containing control coating,. 1st sample, withstands about 10 days. Silicon coating samples from the 2nd to the 12th has no visible changes after a 6-week trial period. Packages of 5 coated glass sheets were tested, each of which has a surface area of 300, the sheets being separated by a granular interlayer material and placed in a chamber in which the temperature of the bsrc and relative humidity is maintained 95-100%. With an increase in the ethylene content of the silane-containing gas, the refractive index of the coating decreases. Therefore, both the light reflection and the reflection of solar heat are reduced. In this case, however, there is no noticeable increase in the optical absorption of silicon coatings; therefore, any decrease in reflectivity is accompanied by an increase in light transmission and heat transfer. The change while refraction occurs without any significant changes in the thickness of the coating, as shown in Table. one. In another series of experiments on a molten glass bath, soda-lime silicate glass was made, which was then coated with a silicon-containing coating according to the proposed method, and the resulting coating was extremely resistant to alkali. The coating is applied at the outlet of the vessel in which the molten metal bath is located, where the glass temperature is 600-650 ° C. The results obtained here are summarized in table 3. In table. 4 shows the optical properties of the samples. Gaps in the data table. 3 and 4; means that these values are not measured during the experiments. In tab. 5 shows examples of used electron-donating compositions. The alkali resistance of all the coatings obtained is compared with the alkali resistance of the coatings described above, obtained using ethylene as an electron donor. It is most convenient to use such a composition that is in a gaseous state at room temperature, The proposed blend can be used when processing different grades of commercially produced stele of different types, which can be passed through a coating position, such as window glass, optical glass and glass fibers. table 2 Table 3 0.4 605 0.24 580 Ammonia 1,3 680 NHa Ammonia 620 0.7 NH, 0.55 605 0.32 612
权利要求:
Claims (2) [1] 1. US patent 3801361, cl. 117-124 E, 1974. [2] 2. US Patent No. 3821020, cl. 427-226, published. 1974 (prototype
类似技术:
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同族专利:
公开号 | 公开日 DE2808780A1|1978-09-14| GB1573154A|1980-08-13| JPS53130717A|1978-11-15| LU79149A1|1978-09-28| SE7802257L|1978-09-02| DK149924B|1986-10-27| BR7801209A|1978-12-12| JPS5728379B2|1982-06-16| ZA781053B|1979-10-31| NO780671L|1978-09-04| AR217280A1|1980-03-14| ES467480A1|1979-08-01| FI780699A|1978-09-02| FI62522B|1982-09-30| NO143100C|1980-12-17| FI62522C|1983-01-10| NO143100B|1980-09-08| MX147940A|1983-02-08| NL7802090A|1978-09-05| DK149924C|1987-06-29| DD136045A6|1979-06-13| AU516481B2|1981-06-04| US4188444A|1980-02-12| DE2808780C2|1985-10-24| CS212268B2|1982-03-26| PL112933B1|1980-11-29| IT1111431B|1986-01-13| IT7867404D0|1978-02-28| BE864413A|1978-08-28| NL179042C|1986-07-01| PL204996A1|1978-12-18| FR2382511B1|1981-01-02| CA1110119A|1981-10-06| FR2382511A1|1978-09-29| DK93678A|1978-09-02| AU3348778A|1979-08-30| TR20091A|1980-07-08| SE431866B|1984-03-05| RO75434A7|1981-04-30|
引用文献:
公开号 | 申请日 | 公开日 | 申请人 | 专利标题 US2439689A|1948-04-13|Method of rendering glass | DE395978C|1921-05-28|1924-05-24|Siemens & Halske Akt Ges|Process for the production of a reflective silicon coating| US3873352A|1971-12-17|1975-03-25|Owens Illinois Inc|Abrasion resistant one step glass coating with excellent labelability| US3984608A|1974-04-17|1976-10-05|Kerr Glass Manufacturing Corporation|Glassware having improved resistance to abrasion| GB1507465A|1974-06-14|1978-04-12|Pilkington Brothers Ltd|Coating glass|US4298650A|1980-03-31|1981-11-03|Eastman Kodak Company|Phosphorescent screens| JPS6215496B2|1981-08-06|1987-04-08|Asahi Glass Co Ltd| CA1245109A|1983-10-31|1988-11-22|Hsien-Kun Chu|Method of forming amorphous polymeric halosilanefilms and products produced therefrom| GB8420534D0|1984-08-13|1984-09-19|Pilkington Brothers Plc|Coated products| US5165972A|1984-08-13|1992-11-24|Pilkington Plc|Coated glass| JPH0476101B2|1984-10-16|1992-12-02|Mitsubishi Electric Corp| JPS6345092B2|1984-11-09|1988-09-08|Mitsubishi Electric Corp| JPS61161763U|1985-03-29|1986-10-07| US4661381A|1985-10-07|1987-04-28|Libbey-Owens-Ford Co.|Continuous vapor deposition method for producing a coated glass article| JPH0521020Y2|1985-12-05|1993-05-31| US4749430A|1986-10-16|1988-06-07|Shell Oil Company|Method of making an encapsulated assemblage| US4869966A|1986-10-16|1989-09-26|Shell Oil Company|Encapsulated assemblage and method of making| JPS6430458U|1987-08-13|1989-02-23| GB8814922D0|1988-06-23|1988-07-27|Pilkington Plc|Coatings on glass| AT136253T|1989-02-21|1996-04-15|Libbey Owens Ford Co|COATED GLASS ITEMS| US5328768A|1990-04-03|1994-07-12|Ppg Industries, Inc.|Durable water repellant glass surface| US5171414A|1990-12-10|1992-12-15|Ford Motor Company|Method of making transparent anti-reflective coating| US5106671A|1990-12-10|1992-04-21|Ford Motor Company|Transparent anti-reflective coating| JP3139031B2|1991-02-21|2001-02-26|日本板硝子株式会社|Heat shielding glass| US5234748A|1991-06-19|1993-08-10|Ford Motor Company|Anti-reflective transparent coating with gradient zone| CA2084247A1|1992-03-18|1993-09-19|Francis Paul Fehlner|Lcd panel production| US5580364A|1992-07-11|1996-12-03|Libbey-Owens-Ford Co.|Method of producing a coated glass substrate exhibiting reflected color| EP0583871B2|1992-07-11|2004-01-07|Pilkington United Kingdom Limited|Method for preparing reflecting coatings on glass| FR2695118B1|1992-09-02|1994-10-07|Air Liquide|A method of forming a barrier layer on a surface of a glass object.| GB9400320D0|1994-01-10|1994-03-09|Pilkington Glass Ltd|Coating on glass| GB9400319D0|1994-01-10|1994-03-09|Pilkington Glass Ltd|Coatings on glass| GB9400323D0|1994-01-10|1994-03-09|Pilkington Glass Ltd|Coatings on glass| US5665424A|1994-03-11|1997-09-09|Sherman; Dan|Method for making glass articles having a permanent protective coating| US5723172A|1994-03-11|1998-03-03|Dan Sherman|Method for forming a protective coating on glass| CA2159296C|1994-10-14|2007-01-30|Michel J. Soubeyrand|Glass coating method and glass coated thereby| CN1051534C|1994-11-22|2000-04-19|秦皇岛开发区蓝光玻璃新技术公司|Float process for on-line production of coated glass| GB9500330D0|1995-01-09|1995-03-01|Pilkington Plc|Coatings on glass| US6055828A|1997-12-30|2000-05-02|Closure Medical Corporation|Treatment methods for glass medical adhesive applicators| US6350397B1|1999-03-10|2002-02-26|Aspen Research Corporation|Optical member with layer having a coating geometry and composition that enhance cleaning properties| WO2002080244A2|2001-02-12|2002-10-10|Asm America, Inc.|Improved process for deposition of semiconductor films| WO2003064345A1|2002-01-31|2003-08-07|Nippon Sheet Glass Company, Limited|Method for producing glass plate with thin film and glass plate| US6919133B2|2002-03-01|2005-07-19|Cardinal Cg Company|Thin film coating having transparent base layer| DE60309441T2|2002-03-01|2007-09-20|Cardinal Cg Co., Eden Prairie|THIN FILM COATING WITH A TRANSPARENT FOUNDRY LAYER| JP5005170B2|2002-07-19|2012-08-22|エーエスエムアメリカインコーポレイテッド|Method for forming ultra-high quality silicon-containing compound layer| US20050044894A1|2003-08-29|2005-03-03|Douglas Nelson|Deposition of silica coatings on a substrate| DE102004012977A1|2004-03-17|2005-10-06|Institut für Neue Materialien Gemeinnützige GmbH|Scratch-resistant multilayer optical system on a crystalline substrate| US20050221003A1|2004-03-31|2005-10-06|Remington Michael P Jr|Enhancement of SiO2 deposition using phosphoruscompounds| US20050271893A1|2004-06-04|2005-12-08|Applied Microstructures, Inc.|Controlled vapor deposition of multilayered coatings adhered by an oxide layer| US7638167B2|2004-06-04|2009-12-29|Applied Microstructures, Inc.|Controlled deposition of silicon-containing coatings adhered by an oxide layer| US7879396B2|2004-06-04|2011-02-01|Applied Microstructures, Inc.|High aspect ratio performance coatings for biological microfluidics| US7966969B2|2004-09-22|2011-06-28|Asm International N.V.|Deposition of TiN films in a batch reactor| US7629267B2|2005-03-07|2009-12-08|Asm International N.V.|High stress nitride film and method for formation thereof| WO2007075369A1|2005-12-16|2007-07-05|Asm International N.V.|Low temperature doped silicon layer formation| US7691757B2|2006-06-22|2010-04-06|Asm International N.V.|Deposition of complex nitride films| US7629256B2|2007-05-14|2009-12-08|Asm International N.V.|In situ silicon and titanium nitride deposition| US7833906B2|2008-12-11|2010-11-16|Asm International N.V.|Titanium silicon nitride deposition| CN101618952B|2009-07-30|2011-08-17|杭州蓝星新材料技术有限公司|Method for on-line producing transparent conducting film glass by floating way| CN102584023A|2012-02-22|2012-07-18|株洲旗滨集团股份有限公司|Solar control coated glass preparation method and glass thereof| WO2014081030A1|2012-11-26|2014-05-30|旭硝子株式会社|Method for forming thin film| CN106007395A|2016-05-11|2016-10-12|刘畅|Method for manufacturing glass easy to clean for kitchen and bathroom electric appliances|
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申请号 | 申请日 | 专利标题 GB8641/77A|GB1573154A|1977-03-01|1977-03-01|Coating glass| 相关专利
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